According to the article North Carolina State University have developed a=20
GaN process that reduces deposition defects by 1000:1

In a nutshell, they have discovered that placing voids in the substrate the=
=20
defects in the deposition film the defects 'stretch out' making a smooth=20
surface where a bump or crinkle once was.

<http://news.ncsu.edu/releases/wmsbedairganvoids/ >=20

And if you feel rich for US$28 or $3.99 to rent the article

http://apl.aip.org/resource/1/applab/v98/i2/p023115_s1?isAuthorized=3Dno

Colin
--
cdb,   3/07/2009
=20
--




colin@btech-online.co.uk

--=20
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