>The method is used extensively for cleaning jewellery and small parts
>(even semiconductor chips during processing). The acid varies from HNO3
>10% at room temperature to HNO3+H2SO4+HCL+H2O2 at 70C (Ouch).

        Ugh, baby, it hurts! ;oO


---8<---Corte aqui---8<----

Alexandre Souza
taito@terra.com.br
http://planeta.terra.com.br/lazer/pinball/

---8<---Corte aqui---8<----

--
http://www.piclist.com hint: To leave the PICList
mailto:piclist-unsubscribe-request@mitvma.mit.edu